Characterization of periodical structures with dimensions in the sub-lambda domain.

The term scatterometry summarizes multiple non-imaging optical measurement methods used to reconstruct periodic structures down to nanometer size, i.e. below the optical Abbe-limit. Scatterometry has proved to be a powerful technique for CD and profile metrology and has established itself as one of the mainly applied methods for CD metrology in semiconductor industry.

Finished Projects

  • Design and Fabrication of Near- to Far-Field Transformers by Sub-100 nm Two-Photon-Polymerization (DFG)
  • Development of functional sub-100 nm structures with 3D-Two-Photon-Polymerisation-Technique and optical methods for characterization (DFG)


  1. Ferreras Paz, V., Frenner, K., & Osten, W. (2014). Increasing Scatterometric Sensitivity by Simulation Based Optimization of Structure Design. In W. Osten (Ed.), Fringe 2013 - 7th International Workshop on Advanced Optical Imaging and Metrology (pp. 345–348). Springer Berlin Heidelberg.
  2. Ferreras Paz, V., Peterhänsel, S., Frenner, K., & Osten, W. (2012). Solving the inverse grating problem by white light interference Fourier scatterometry. Nature Light: Science & Applications, 1(11), e36.
  3. Bilski, B., Frenner, K., & Osten, W. (2011). About the influence of Line Edge Roughness on measured effective–CD. Optics Express, 19(21), 19967.
  4. Ferreras Paz, V., Peterhänsel, S., Frenner, K., Osten, W., Ovsianikov, A., Obata, K., & Chichkov, B. (2011). Depth sensitive Fourier-Scatterometry for the characterization of sub-100 nm periodic structures. In Proceedings of SPIE (Vol. 8083, p. 80830M–80830M–9).
  5. Osten, W., Ferreras Paz, V., Frenner, K., Schuster, T., & Bloess, H. (2009). Simulations of Scatterometry Down to 22 nm Structure Sizes and Beyond with Special Emphasis on LER. In AIP Conference Proceedings (Vol. 1173, pp. 371–378). AIP.
  6. Schuster, T., Rafler, S., Ferreras Paz, V., Frenner, K., & Osten, W. (2009). Fieldstitching with Kirchhoff-boundaries as a model based description for line edge roughness (LER) in scatterometry. Microelectronic Engineering, 86(4-6), 1029–1032.
  7. T. Schuster, S. Rafler, W. Osten, P. Reinig, T. Hingst, "Scatterometry from crossed grating structures in different configurations", Proc. SPIE 6617, 661715-1 – 661715-9 (2007)
  8. M. Totzeck: „Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields", Optik 112 (9), 399-406 (2001)
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