Light - Advanced Manufacturing "Celebrating Holography after 60 years of successful application"
The invention of Holography by Dennis Gabor goes back to the year 1948. Gabor could show that the complete original wavefront of the object both with its amplitude and phase can be reconstructed by adding a coherent background to a wave coming from an object while recording in a proper storage medium. However, it should take more than 20 years to make the great potential of this method accessible to numerous applications. The lack of light sources with high spectral energy density was overcome as Theodore Maiman demonstrated the first operating laser in 1960. A few years later, Emmett Leith and Juris Upatnieks, two physicists at the University of Michigan, implemented their off-axis scheme as a smart combination of Gabor’s holographic principle with the carrier frequency technique known from side-looking radar. The symbiosis of the holographic and laser principle opened the door for a large variety of new technologies and applications in optical imaging, information processing, and metrology such as display holography, computer-generated holography, diffractive optics, holographic interferometry, holographic nondestructive testing, holographic pattern recognition, and holographic storage technology.
In 2021, 60 years after the publication of the seminal article by Leith and Upatnieks, 55 years after the invention of Holographic Interferometry by Stetson and Powell, and 50 years after Gabor’s remarkable Nobel lecture, the editors took the opportunity to celebrate these groundbreaking contributions to modern optics with a special edition of Light: Advanced Manufacturing. This special issue contains 39 papers written by well-known experts in that field. Because these contributions address many different issues, we decided on a structure of 5 main topics:
- 6 papers “Celebrating Holography and its Impact over 60 years”
- 8 papers dealing with the “Digital Transition of Holography”
- 8 papers describing the Potential of Holography for the “Making of new Optical Components”
- 10 papers addressing the “Wide Field of Applications” opened by Holography, and
- 7 papers discussing “Perspectives of Holographic Technologies”.
Light Advanced Manufacturing link
Optical Inspection of Microsystems, Second Edition
Where conventional testing and inspection techniques fail at the microscale, optical techniques provide a fast, robust, noninvasive, and relatively inexpensive alternative for investigating the properties and quality of microsystems. Speed, reliability, and cost are critical factors in the continued scale-up of microsystems technology across many industries, and optical techniques are in a unique position to satisfy modern commercial and industrial demands.
Optical Inspection of Microsystems, Second Edition, extends and updates the first comprehensive survey of the most important optical measurement techniques to be successfully used for the inspection of microsystems. Under the guidance of accomplished researcher Wolfgang Osten, expert contributors from industrial and academic institutions around the world share their expertise and experience with techniques such as image processing, image correlation, light scattering, scanning probe microscopy, confocal microscopy, fringe projection, grid and moire techniques, interference microscopy, laser-Doppler vibrometry, digital holography, speckle metrology, spectroscopy, and sensor fusion technologies. They also examine modern approaches to data acquisition and processing, such as the determination of surface features and the estimation of uncertainty of measurement results. The book emphasizes the evaluation of various system properties and considers encapsulated components to increase quality and reliability. Numerous practical examples and illustrations of optical testing reinforce the concepts.
- Supplying effective tools for increased quality and reliability, this book
- Provides a comprehensive, up-to-date overview of optical techniques for the measurement and inspection of microsystems
- Discusses image correlation, displacement and strain measurement, electro-optic holography, and speckle metrology techniques
- Offers numerous practical examples and illustrations
- Includes calibration of optical measurement systems for the inspection of MEMS
- Presents the characterization of dynamics of MEMS
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Fringe 2013: 7th International Workshop on Advanced Optical Imaging and Metrology
In continuation of the FRINGE Workshop Series this Proceeding contains all contributions presented at the 7. International Workshop on Advanced Optical Imaging and Metrology. The FRINGE Workshop Series is dedicated to the presentation, discussion and dissemination of recent results in Optical Imaging and Metrology. Topics of particular interest for the 7. Workshop are:
- New methods and tools for the generation, acquisition, processing, and evaluation of data in Optical Imaging and Metrology (digital wavefront engineering, computational imaging, model-based reconstruction, compressed sensing, inverse problems solution)
- Application-driven technologies in Optical Imaging and Metrology (high-resolution, adaptive, active, robust, reliable, flexible, in-line, real-time)
- High-dynamic range solutions in Optical Imaging and Metrology (from macro to nano)
- Hybrid technologies in Optical Imaging and Metrology (hybrid optics, sensor and data fusion, model-based solutions, multimodality)
- New optical sensors, imaging and measurement systems (integrated, miniaturized, in-line, real-time, traceable, remote)
Special emphasis is put on new strategies, taking into account the active combination of physical modeling, computer aided simulation and experimental data acquisition. In particular attention is directed towards new approaches for the extension of existing resolution limits that open the gates to wide-scale metrology, ranging from macro to nano, by considering dynamic changes and using advanced optical imaging and sensor systems.
Now availabe here!
Optical Imaging and Metrology: Advanced Technologies
A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.
Now availabe here!
Fringe 2009: 6th International Workshop on Advanced Optical Metrology
The purpose of the Fringe Proceedings is to present to engineers, scientists and industrial experts the state-of-the-art and the impact of Optical Metrology in Imaging, Surface Monitoring, Stress Analysis, Non-Destructive Testing, Quality Control, and related fields.
Topics of particular interest are:
- New Methods and Tools for the Generation, Acquisition, Processing, and Evaluation of Data in Optical Metrology (Digital Wavefront Engineering)
- Application Enhanced Technologies in Optical Metrology (Addressing enhanced Resolution, Reliability and Flexibility)
- 4D Optical Metrology over a Large Scale Range (from Macro to Nano)
- Hybrid Measurement Techniques (Sensor Fusion and the Unification of Modeling, Simulation and Experiment)
- New Optical Sensors and Measurement Systems for Industrial Inspection.
Special emphasis is put on modern measurement strategies, taking into account the active combination of physical modelling, computer aided simulation and experimental data acquisition. Special emphasis is directed towards new approaches for the extension of existing resolution limits that open the gates to wide scale metrology, ranging from nano to macro, by using advanced optical sensor systems.
Now availabe here!
Optical Inspection of Microsystems
Where conventional testing and inspection techniques fail at the micro-scale, optical techniques provide a fast, robust, and relatively inexpensive alternative for investigating the properties and quality of microsystems. Speed, reliability, and cost are critical factors in the continued scale-up of microsystems technology across many industries, and optical techniques are in a unique position to satisfy modern commercial and industrial demands. Optical Inspection of Microsystems is the first comprehensive, up-to-date survey of the most important and widely used full-field optical metrology and inspection technologies. Under the guidance of accomplished researcher Wolfgang Osten, expert contributors from industrial and academic institutions around the world share their expertise and experience with techniques such as image correlation, light scattering, scanning probe microscopy, confocal microscopy, fringe projection, grid and moire techniques, interference microscopy, laser Doppler vibrometry, holography, speckle metrology, and spectroscopy. They also examine modern approaches to data acquisition and processing. The book emphasizes the evaluation of various properties to increase reliability and promote a consistent approach to optical testing. Numerous practical examples and illustrations reinforce the concepts. Supplying advanced tools for microsystem manufacturing and characterization, Optical Inspection of Microsystems enables you to reach toward a higher level of quality and reliability in modern micro-scale applications.
Now availabe here!
Fringe 2005: The 5th International Workshop on Automatic Processing of Fringe Patterns
The purpose of the Fringe Proceedings is to present to engineers, scientists and industrial experts the state-of-the-art and the impact of Computer aided Evaluation in Structured Light Techniques, Holographic Interferometry, Classic Interferometry, Speckle Metrology, Moiré and Grid Techniques for Stress Analysis, Nondestructive Testing, Shape Measurement, Fault Detection, Quality Control and related fields.
Topics of particular interest are:
- Advanced Computer Aided Measurement Techniques;
- Resolution Enhanced Technologies in Optical Metrology;
- New approaches in Wide Scale 4D Optical Metrology;
Sophisticated Sensors Systems and their applications for the solution of challenging measurement problems. Special emphasis is put on modern Measurement Strategies taking into account the active combination of Physical Modeling, Computer Aided Simulation and Experimental Data Acquisition. Further attention is directed to new approaches for the Extension of Existing Resolution Limits that open the gates to Wide Scale Metrology ranging from nano to macro by using Advanced Optical Sensor Systems.
Now availabe here!